English
русский
SEARCH
Niobium round targets are used in various high-tech applications, primarily in the field of thin film deposition processes such as sputtering or physical vapor deposition (PVD). Niobium, like tantalum, is known for its unique set of properties, including high melting point, corrosion resistance, and excellent conductivity.
Products | Size（mm） | Grade Nos | Specification |
Niobium & Niobium Slab | （1~2.5）×（8~300）×L | R04200, R04210 | ASTM B393 |
（2.5~6）×（20~1000）×L | |||
（6~20）×（20~1000）×L |
Niobium sputtering targets provide exceptional advantages: high purity ensures superior thin film quality, outstanding corrosion resistance guarantees longevity in harsh environments, and low thermal expansion minimizes stress during deposition. As a trusted niobium products company, manufacturers in this field continue to develop advanced materials with excellent compatibility across various coating techniques, making them ideal for semiconductor, optical, and superconductive applications.
PHONE
ADDRESS
Gaoya Village Industrial Park, Banyu Town, Baoji City, Shaanxi Province, China
