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Tantalum sputtering targets are core raw materials for magnetron sputtering (PVD) processes. Leveraging high melting point, excellent chemical stability, and superior barrier diffusion properties, they have become indispensable high-end metal consumables for the semiconductor, optical coating, medical device, and display industries. Baoji Aulister is located in Baoji, China's non-ferrous metals industry base. Relying on the local complete refractory metal supply chain, we specialize in the R&D, forging, rolling, and precision machining of high-purity tantalum targets, providing global customers with stable and reliable customized tantalum target solutions.
Our tantalum targets are produced from high-purity tantalum raw materials, processed through vacuum melting, multi-pass forging, precision rolling, and controlled annealing. These processes effectively ensure high density, uniformly refined grain structure, and low oxygen impurity levels. Our product range includes circular tantalum targets, rectangular planar tantalum targets, and annular targets. We also provide supporting services such as backing plate brazing, high-precision machining, and mirror polishing. Dimensions, tolerances, and surface standards can all be customized according to customer drawings. The excellent internal microstructure ensures stable sputtering rates, uniform film thickness, reduced particle defects, and significantly improved downstream coating yield rates.
In the semiconductor field, tantalum targets are primarily used for copper interconnect barrier layers in chips, forming Ta/TaN thin films to prevent copper atom diffusion and ensure long-term operational stability of integrated circuits. They are widely adapted for memory chips, power devices, and advanced logic chip production. The optical industry utilizes tantalum sputtering to form tantalum oxide optical thin films for optical lenses, filters, and AR/VR optical components. Meanwhile, tantalum's excellent biocompatibility means related thin films are also applied in medical implant device coatings. In addition, high-purity tantalum targets have broad application prospects in flat panel displays, sensors, decorative coatings, and other fields.
As an integrated manufacturing and trading enterprise at the source, we also deal in titanium, tantalum, niobium, molybdenum, nickel series non-ferrous metal products, and various precision-machined plates and targets. We possess mature mass supply capabilities. Unlike ordinary traders,
| Parameter | Conventional Standard Specifications | High-End Semiconductor Custom Specifications | Notes |
| Material Grade | R05200, R05400 (Pure Tantalum Ta1/Ta2) | R05400 | Compliant with ASTM B708 standard |
| Purity | 99.95% (3N5), 99.99% (4N) | 99.995% (4N5) ~ 99.999% (5N) | Higher purity means fewer thin film impurities |
| Theoretical Density | 16.6 g/cm³, Relative Density ≥99.5% | Relative Density ≥99.8% | Eliminates internal voids, reduces arcing |
| Average Grain Size | 50–100 μm | ≤50 μm fine grain structure | More uniform grain ensures more stable sputtering rate |
| Crystal Texture | Primarily {111}, adjustable {100}/{110} | Custom directional texture control as required | Directly affects deposition rate and film thickness uniformity |
| Surface Roughness | Ra ≤0.8 μm | Ra ≤0.4 μm | Mirror polishing to reduce particle generation |
| Dimensional Tolerance | Diameter/Length-Width ±0.1–0.2 mm; Thickness ±0.05 mm | ±0.02–0.05 mm | Tighter tolerances available per customer drawings |
| Optional Backing Plate | Oxygen-Free Copper (OFHC) Backing Plate | Oxygen-Free Copper (OFHC) Backing Plate | Supports indium soldering, elastomer bonding, mechanical assembly |
| Conventional Shapes | Round targets, rectangular planar targets, annular targets | Special shapes, rotary targets, stepped-structure targets | All customizable per drawings |
Our factory maintains direct control over every production process, supporting both small-batch sampling and large-volume orders in parallel, flexibly accommodating customer R&D testing and mass production needs. We strictly implement internationally accepted material standards and can provide material certificates and purity test reports, following up throughout the production, inspection, and shipping processes.
As global competition in the thin film manufacturing industry intensifies, stable and highly consistent target supply directly determines production line efficiency. Baoji Aulister insists on strict quality control, offering overseas customers a high-quality alternative to expensive imported targets at reasonable ex-factory prices. Whether you require standard specification tantalum targets in stock, or custom products with special dimensions and special purity, we welcome you to send your drawings, technical parameters, and procurement requirements for inquiry. Our technical team will quickly evaluate your project and promptly provide sample quotations, lead times, and complete technical support. We look forward to establishing long-term, stable partnerships with thin film and semiconductor enterprises worldwide.
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